INFLUENCE OF DISTORTIONS OF THE TOPOLOGY OF FILM CONDUCRORS OF AN ELECTROSTATIC UNIT ON THE DEGREE OF UNIFORMITY OF THE GENERATED ELECTRIC FIELD

Photolithography is one of the most common technological processes for the formation of a given topology of film conductors on a flat surface. However, if it is necessary to obtain a pattern in film conductors on a curved surface, for example, on the inner wall of a glass cylinder, significant difficulties arise, which ultimately affect the reproducibility of the technological process and the yield of suitable products. The article deals with the formation of a given topology of film conductors on the example of an electrostatic unit for deflecting an electron beam made of glass and having the shape of a cylinder. The features of the resulting topology, made using photolithography and when the film is evaporated from a glass surface by a series of laser pulses, are compared. The influence of the distortion of the width of the insulating gap between the film electrodes on the degree of homogeneity of the generated electrostatic deflecting field is estimated. The results obtained make it possible to set technological tolerances when organizing the production of such film assemblies of radio electronic equipment (REA).

Authors: D. A. Gerasimov, V. A. Tupik

Direction: Electrical Engineering

Keywords: Film electrostatic nodes, Laplace equations, topology distortion, laser lithography

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