SHORTENING THE DURATION OF OBSERVATION OF THE SUBSTRATE HEATING KINETICS URING MAGNETRON SPUTTERING OF A COPPER TARGET
The kinetics of heating and cooling of the substrate during magnetron sputtering of a copper target has been investigated. A thermocouple sensor with a sensitive element in the form of a copper disk is used to study the kinetics of thermal proc-esses on substrates. It was found that the kinetic dependence of heating is exponential. To reduce the duration of obser-vation of this process, it is proposed to use the extrapolation of the kinetic dependence to the stationary state region. The relative extrapolation error was used as a criterion for choosing a shortened observation interval. A technique for reducing the duration of the experiment is proposed. It is universal in nature for installations similar in type and structure to the one used in this work. For its application in each practical case, it is necessary to carry out one long-term experiment in which the process of heating the substrate reaches a steady state.
Authors: V. A. Pavlov, V. I. Shapovalov, D. S. Shestakov, A. V. Kochyn, A. V. Rudakov, A. E. Shabalin
Keywords: Magnetron, target, substrate, sputtering, thermal process
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