Magnetron for depositing quaternary alloy films

The objective of this work is to investigate a new variant of a multilayer target mounted on a balanced magnetron and designed for the synthesis of a film of a four-component equiatomic alloy. The sputtered region of the target has the shape of a ring with inner and outer radii R₀₁ and R₀₂, respectively. The target consists of four sputtered metal plates. The plates are mounted on the same axis as the magnetron. The inner solid sputtered metal plate serves as a refrigerator. The two middle plates and the outer plate are made of other metals and represent rings with inner radii R₂, R₃ and R₄, respectively. A system of equations for calculating these radii is derived from the equiatomicity condition of the alloy. The presentation is illustrated by an example with a target designed for the deposition of a TiTaNbMo alloy film.

Authors: V. I. Shapovalov, D. S. Sharkovskii, J. K. Zephaniah, A. V. Nikolaev

Direction: Physics

Keywords: equiatomic alloy, film, magnetron sputtering, multilayer target, titanium, tantalum, niobium, molybdenum

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