Experimental theoretical study of the thermal process during sputtering of a hot titanium target
The aim of the work was to study the thermal process leading to substrate heating during magnetron sputtering of a two-layer target in argon. The outer titanium plate, sputtered by an argon ion flow, working in the hot mode, could be heated up to the melting point. The inner copper plate, cooled by running water, served as a refrigerator. In the work, the kinetics of substrate heating were measured at different magnetron discharge powers and the thermal process on the target was simulated. A thermocouple sensor was used for the measurements. The modelling was performed using the COMSOL Multiphysics package, which made it possible to establish the non-uniformity of the surface temperature of the outer plate. The analysis of the results made it possible to isolate the area of the outer plate that most significantly affects the heating of the substrate and to establish the dependence of the effective temperature of the outer plate on the discharge power.
Authors: V. I. Shapovalov, D. S. Sharkovskii, D. I. Belenko
Direction: Physics
Keywords: magnetron, hot target, titanium, volt-ampere characteristic, thermionic emission, glow discharge, arc discharge
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