Simulation of reactive sputtering. Fundamentals

This work aims to describe the fundamental principles whose application for the purposes of modelling various physical and chemical processes has proven to be effective. The model of a process is defined as its representation using another similar (or identical) process, constructed based on a number of simplifying assumptions. Such a representation is referred to as a physicochemical model. The main phenomena occurring on the surfaces and in the gaseous environment of a spray system, which are used in developing reactive sputtering models, are identified. A scheme for deriving a system of equations describing the model in an analytical form is given. An example of modelling based on a non-isothermal surface chemical reaction is given, which demonstrates the possibility of studying immeasurable dependencies characterizing the process of reactive sputtering experimentally.

Authors: V. I. Shapovalov

Direction: Physics

Keywords: reactive sputtering, model, chemisorption, implantation, diffusion, surface chemical reaction, evaporation, thermionic emission, model adequacy

---

View full article